sputtering Targets
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Contact UsTitanium Targets for Semiconductor Devices
We produce sputtering targets for thin film devices, helping to increase functionality in a wide range of electronic parts.
By making the metal structure fine and uniform, we have achieved low particle size from the initial stage of use to the end of life.
Features
- Achieves low particle size by fine and uniform metal structure and surface treatment
Impurity content(Unit: ppm)
| Grade | Fe | Ni | Cr | Na | K | O |
|---|---|---|---|---|---|---|
| 5N UP | <9 | <5 | <5 | <0.03 | <0.05 | <200 |
| 4N5 UP | <20 | <20 | <20 | <0.1 | <0.1 | <200 |
| 4N UP | <50 | <20 | <10 | <0.1 | <0.1 | <650 |
| 3N5 UP | <200 | <20 | <10 | <0.1 | <0.1 | <1000 |
Examples of uses
- Semiconductor devices
Niobium Targets for Semiconductor Devices
We produce sputtering targets for thin film devices, helping to increase functionality in a wide range of electronic parts.
These targets have a fine, uniform metal composition and dramatically reduced impurities, resulting in films with outstanding properties such as glare prevention for displays.
Features
- Dramatically reduced impurities and outstanding glare prevention for displays
Impurity content (Unit: ppm)
| Grade | Fe | Ni | Cr | Na | K | O |
|---|---|---|---|---|---|---|
| Typical | <5 | <10 | <5 | <0.1 | <0.1 | <64 |
Examples of uses
- Glare-proof films
- For projectors
- For video cameras
- For DVD pickup
CrAlX Alloy Targets for Hard Thin Films
The effects of the additive elements are used to achieve a film that will not lose hardness in high temperatures. This hard film is ideal for extending the life of parts such as molds.
Features
- High hardness even at high temperatures
Examples of uses
- Protective film for molds
If you have any inquiries, please contact us.
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