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Product Information

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Fine Ceramics
- Aluminum nitride Fine Ceramics
- Silicon nitride Fine Ceramics
Aluminum nitride Fine Ceramics
Most desirable heat dissipation substrates for electronics use

Product Information
Aluminum nitride (AlN) substrates
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Outline
Heat dissipation Fine Ceramics came to be an essential material for electronics devices that meet the needs of high output, large-scale integration, thin and light body, higher frequency and environment friendliness.
We offer the world's highest heat-conductive aluminum nitride (AlN) substrates that we manufacture with our core technology: grain boundary control of ceramic microstructure.
Advantages
- High heat conductivity
- High insulation and high withstanding voltage
- Low thermal expansion coefficient similar to those of Si, GaN and GaAs semiconductors
- Substitutes high heat-conductive but toxic berylia (BeO) substrates.

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Applications
- Power module substrates for automobiles or power semiconductors
- Substrates for high-frequency circuits
- AlN package for light-emitting diode (LED)
- Sub-mounting substrates for optical pickup devices for both DVDs and CDs
- Heat dissipation substrates
FAQ
FAQ on aluminum nitride Fine Ceramics
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Silicon nitride (Si3N4) Fine Ceramics
Ultimate properties are available for structural use.

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Outline
Toshiba Materials offers silicon nitride (Si3N4) Fine Ceramics that have excellent mechanical properties such as high strength, high stiffness and high abrasion resistance. In particular, silicon nitride (Si3N4) Fine Ceramics are used as bearing balls to make high-performance bearings that are incorporated into various machines.
Advantages
- High strength
- Excellent abrasion resistance
- High stiffness
- Excellent corrosion resistance
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Typical applications

FAQ
FAQ on silicon nitride Fine Ceramics
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