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AlN thin film metallized substrates

AlN thin film metallized substrates

Outline

Toshiba Materials offers AlN thin film metallized substrates that have a Ti/Pt/Au thin film pattern made by the lift-off process on AlN substrates of the world's highest thermal conductivity. They are applied to optical communication parts, and DVD and CD pickup substrates that are required to have highly stable thermal properties. We line up AlN thin film metallized substrates of different thermal conductivity that may best fit your temperature requirements.

Advantages

  • Excellent heat dissipation because of high thermal conductivity
  • Environmentally conscious material because they substitute high heat-conductive but toxic berylia (BeO) substrates

Semiconductor Laser

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